Photochemically- and Force-Initiated Brush Polymer Microarrays and Their Applications

Event information
Venue:OE134, MMC


We have used polymer pen lithography (PPL) and beam pen lithography (BPL), two recently developed tip-based printing methods, to create microarrays of grafted-from brush polymers. Using the unique ability of the elastomeric tips to apply a force, the first method to covalently pattern graphene by a Diels-Alder oligomerization was shown.[1] These force accelerated cycloadditions are a feasible route to locally alter the chemical and electronic composition of graphene defect and edge sites under ambient temperature and atmosphere over large (>1 cm2) areas. Alternatively BPL arrays were used to pattern acrylate and methacrylate monomers onto thiol-terminated glass slides. Subsequent exposure to UV light produced brush polymers whose length is controlled precisely by irradiation time, resulting in a 3D lithography method with sub-micrometer control over feature position, feature diameter, and feature height. Thus, PPL and BPL are powerful tools for studying photochemical and force-induced brush polymerizations, and the application of the resulting materials to sensing and electronics will be discussed. [1] Bian, S.; Scott, A.M.; Cao, Y.; Liang, Y.; Osuna, S.; Houk, K.N.; Braunschweig, A.B. J. Am. Chem. Soc. 2013 , 9240-9243.


Born and raised in south Miami, went to undergrad at Cornell, where Dr. Braunschweig worked with Prof. D. Y. Sogah on group transfer polymerization. PhD with Prof. J. Fraser Stoddart at UCLA, working on molecular machines and supramolecular chemistry. Postdoc with Prof. Chad Mirkin at Northwestern University on tip-based lithography. Started independent career in the Department of Chemistry and Molecular Design Institute at NYU, but moved to UM after three years. Major independent awards: Air Force Office of Scientific Research Young Investigator Award, ACS Polymeric Materials: Science and Engineering (PMSE) Young Investigator 2014.