Scalable laser nano-engineered thin film processing

Event information
Venue:AHC3-205, MMC


Roll to roll processing of thin film has been one of the most promising and challenging technologies for industries, such as solar cells, LED, and TFT, optic-electric devices, etc. The primary barriers are cost and quality. One of the problems of the current thin film deposition is the crystal defects density, which is too high to have ideal physical property, such as conductivity, electron mobility, and quantum efficiency. In addition, scalable 2D/3D patterned thin film structures are needed for unique physical properties. For example, 3D thin film structures could be used as a strong light absorbent or concentrators. However, the current thin film processing is limited by high temperature, non-selective and high cost. There is a critical need for fast, selective, room temperature and low cost thin film processing techniques. This talk will discuss the process mechanisms of several new processes, which promise to solve most of these problems simultaneously, including laser crystallization, 3D shaping, and surface nanostructuring.


Gary J. Cheng received a B.S. and M.S. in Materials Science from University of Science and Technology Beijing, China, and a Ph.D. from Columbia University in Mechanical Engineering in 2002. He is an Associate Professor at School of Industrial Engineering and School of Mechanical Engineering, Purdue University. His research focuses on laser materials processing, micro/nano manufacturing, bulk manufacturing of micro/nano 3D structures, mechanical/physical property enhancement of materials, renewable energy. He received the Young Investigator Award from the Office of Naval Research (ONR) in 2007 and the CAREER Award from the National Science Foundation (NSF) in 2006, Outstanding Young Manufacturing Engineer award from the Society of Manufacturing Engineer (SME) in 2007, ASME Chao & Trigger Young Investigator award. He has published 80 Journal articles and 14 US patents.

The event is free and open to the public. Undergraduates and graduates are encouraged to attend!